Plasma Removal Device "HDRF"
Remove photoresist and organic polymer residues at low temperatures! Introducing our plasma removal equipment.
We would like to introduce "HDRF," which is handled by Plasma Therm Japan Co., Ltd. It removes photoresist and organic polymer residues at low temperatures, which is particularly important during the device manufacturing stages of MEMS, LEDs, and advanced packaging. Please feel free to contact us if you have any inquiries. 【Features】 ■ Temperature - Low temp: 50℃ to 150℃ - High rate: 150℃ to 250℃ ■ Wafer: 2" to 8" * You can download the English version of the catalog. * For more details, please refer to the PDF materials or feel free to contact us.
- Company：プラズマ・サーモ・ジャパン
- Price：Other
